INVESTIGATION OF INTERFACIAL REACTIONS IN BIMETALLIC THIN-FILM COUPLES OF AL/CU AND PB/CU BY MEASUREMENT OF CONTACT RESISTANCE

被引：9

作者：

SHEARER, MP ^{[1
]}

SEN, SK ^{[1
]}

BAUER, CL ^{[1
]}

机构：

[1] CARNEGIE MELLON UNIV,CTR JOINING MAT,PITTSBURGH,PA 15213

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1982年 / 69卷 / 01期

关键词：

D O I：

10.1002/pssa.2210690112

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：139 / 149

页数：11

共 18 条

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