STUDY OF INTERFACIAL REACTIONS IN BIMETALLIC THIN-FILM COUPLES BY CONTACT RESISTANCE MEASUREMENTS

被引：14

作者：

BAUER, CL

JORDAN, AG

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1978年 / 47卷 / 01期

关键词：

D O I：

10.1002/pssa.2210470138

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：321 / 328

页数：8

共 13 条

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