SUBMILLIAMPERE LASING OF ZN-DIFFUSED MESA BURIED-HETERO ALXGA1-XAS/GAAS MULTI-QUANTUM-WELL LASERS AT 77-K

被引:8
作者
KUROBE, A
FURUYAMA, H
NARITSUKA, S
KOKUBUN, Y
NAKAMURA, M
机构
关键词
SEMICONDUCTING ALUMINUM COMPOUNDS;
D O I
10.1049/el:19860765
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Extremely low-threshold semiconductor lasers were fabricated by forming Zn-diffused mesa buried-hetero (DMB) structures from low-pressure MOCVD-grown Al//xGa//1// minus //xAs/GaAs multi-quantum well, separate-confinement hetero structure wafers, cw threshold currents as low as 880 mu A at 77K and 2. 4 mA at room temperature were obtained from a 100 mu m-long device.
引用
收藏
页码:1117 / 1118
页数:2
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