DIFFUSION OF GOLD INTO SILICON CRYSTALS

被引：75

作者：

SPROKEL, GJ

FAIRFIELD, JM

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1965年 / 112卷 / 2P1期

关键词：

D O I：

10.1149/1.2423495

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：200 / +

页数：1

共 11 条

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[5] PROPERTIES OF GOLD-DOPED SILICON [J].

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CARLSON, RO ;

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[6] GOLD-INDUCED CLIMB OF DISLOCATIONS IN SILICON [J].

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[7] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].

FRANK, FC ;

TURNBULL, D .

PHYSICAL REVIEW, 1956, 104 (03) :617-618

[8]

SPROKEL GJ, TO BE PUBLISHED

[9]

STRUTHERS JD, 1957, J APPL PHYS, V28, P516, DOI 10.1063/1.1722790

[10] SOLUBILITY AND DIFFUSIVITY OF GOLD, IRON, AND COPPER IN SILICON [J].

STRUTHERS, JD .

JOURNAL OF APPLIED PHYSICS, 1956, 27 (12) :1560-1560

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