DIFFUSION MECHANISM IN BULK SILICIDES - RELATION WITH THIN-FILM BEHAVIOR (CASE OF NI2SI FORMATION)

被引：11

作者：

GAS, P

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 38卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90534-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：178 / 184

页数：7

共 20 条

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[7] ISOTOPE-SEPARATION DURING SILICIDE FORMATION BY SOLID-STATE REACTION AND ITS RELATION WITH THE GROWTH LIMITING MECHANISM [J].

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[8]

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[9]

GAS P, 1988, ACTA METALL, V37, P17

[10] INFLUENCE OF DISLOCATIONS ON DIFFUSION KINETICS IN SOLIDS WITH PARTICULAR REFERENCE TO ALKALI HALIDES [J].

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