30 NM LINE FABRICATION ON PMMA RESIST BY FINE FOCUSED BE ION-BEAM

被引：15

作者：

SHIOKAWA, T

AOYAGI, Y

KIM, PH

TOYODA, K

NAMBA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 04期

关键词：

D O I：

10.1143/JJAP.23.L232

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L232 / L233

页数：2

共 7 条

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[2]

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[4]

ISHITANI T, 1981, 5TH P S ION SOURC IO, P129

[5] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION [J].

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[7] 100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION [J].

SHIOKAWA, T ;

KIM, PH ;

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GAMO, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1117-1120

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