THERMAL WAVE IMPLANT DOSIMETRY FOR PROCESS-CONTROL ON PRODUCT WAFERS

被引：10

作者：

WENDMAN, MA

SMITH, WL

机构：

[1] INTEL CORP,LIVERMORE,CA 94550

[2] THERMAWARE INC,FREMONT,CA 94539

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 21卷 / 2-4期

关键词：

D O I：

10.1016/0168-583X(87)90903-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：559 / 562

页数：4

共 11 条

[1]

CHENG JC, 1983, SOLID STATE TECHNOL, V26, P143

[2]

DEMING RO, 1985, SOLID STATE TECHNOL, V28, P163

[3]

GLAWISCHNIG H, 1981, NUCL INSTR METH, V189, P265

[4]

GRUBER GA, 1983, SOLID STATE TECHNOL, V26, P159

[5] THERMAL AND PLASMA-WAVE DEPTH PROFILING IN SILICON [J].

OPSAL, J ;

ROSENCWAIG, A .

APPLIED PHYSICS LETTERS, 1985, 47 (05) :498-500

[6] DETECTION OF THERMAL WAVES THROUGH OPTICAL REFLECTANCE [J].

ROSENCWAIG, A ;

OPSAL, J ;

SMITH, WL ;

WILLENBORG, DL .

APPLIED PHYSICS LETTERS, 1985, 46 (11) :1013-1015

[7]

SMITH WL, 1985, P SOC PHOTO-OPT INST, V530, P201, DOI 10.1117/12.946488

[8] ION IMPLANT MONITORING WITH THERMAL WAVE TECHNOLOGY [J].

SMITH, WL ;

ROSENCWAIG, A ;

WILLENBORG, DL .

APPLIED PHYSICS LETTERS, 1985, 47 (06) :584-586

[9]

SMITH WL, 1986, SOLID STATE TECHNOL, V29, P85

[10]

SMITH WL, 1985, P SOC PHOTO-OPT INST, V530, P188, DOI 10.1117/12.946486

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