ION IMPLANT MONITORING WITH THERMAL WAVE TECHNOLOGY

被引:116
作者
SMITH, WL
ROSENCWAIG, A
WILLENBORG, DL
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D O I
10.1063/1.96079
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O59 [应用物理学];
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页码:584 / 586
页数:3
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共 15 条
[1]   PICOSECOND ELLIPSOMETRY OF TRANSIENT ELECTRON-HOLE PLASMAS IN GERMANIUM [J].
AUSTON, DH ;
SHANK, CV .
PHYSICAL REVIEW LETTERS, 1974, 32 (20) :1120-1123
[2]  
CARDONA M, 1969, MODULATION SPECTROSC, P117
[3]  
HERR D, UNPUB
[4]   PICOSECOND TIME-RESOLVED PLASMA AND TEMPERATURE-INDUCED CHANGES OF REFLECTIVITY AND TRANSMISSION IN SILICON [J].
LIU, JM ;
KURZ, H ;
BLOEMBERGEN, N .
APPLIED PHYSICS LETTERS, 1982, 41 (07) :643-646
[5]   THERMAL-WAVE DETECTION AND THIN-FILM THICKNESS MEASUREMENTS WITH LASER-BEAM DEFLECTION [J].
OPSAL, J ;
ROSENCWAIG, A ;
WILLENBORG, DL .
APPLIED OPTICS, 1983, 22 (20) :3169-3176
[6]  
OPSAL J, 1985, B AM PHYS SOC, V30, P374
[7]   THERMAL-WAVE IMAGING [J].
ROSENCWAIG, A .
SCIENCE, 1982, 218 (4569) :223-228
[8]   THIN-FILM THICKNESS MEASUREMENTS WITH THERMAL WAVES [J].
ROSENCWAIG, A ;
OPSAL, J ;
WILLENBORG, DL .
APPLIED PHYSICS LETTERS, 1983, 43 (02) :166-168
[9]  
Rosencwaig A., 1980, PHOTOACOUSTICS PHOTO
[10]  
ROSENEWAIG A, 1985, B AM SOC, V30, P375