AL SURFACE MOBILITY ON SI(111) DURING INITIAL-STAGES OF IONIZED CLUSTER BEAM DEPOSITION

被引：17

作者：

LEVENSON, LL ^{[1
]}

ASANO, M ^{[1
]}

TANAKA, T ^{[1
]}

USUI, H ^{[1
]}

YAMADA, I ^{[1
]}

TAKAGI, T ^{[1
]}

机构：

[1] KYOTO UNIV,ION BEAM ENGN EXPTL LAB,KYOTO 606,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575361

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1552 / 1556

页数：5

共 23 条

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