HEAVY-ION INDUCED ADHESION OF THIN GOLD-FILMS TO OXIDIZED SUBSTRATES OF TANTALUM AND SILICON

被引：10

作者：

STOKSTAD, RG ^{[1
]}

JACOBS, PM ^{[1
]}

TSERRUYA, I ^{[1
]}

SAPIR, L ^{[1
]}

MAMANE, G ^{[1
]}

机构：

[1] WEIZMANN INST SCI,NUCL PHYS,IL-76100 REHOVOT,ISRAEL

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1986年 / 16卷 / 06期

关键词：

D O I：

10.1016/0168-583X(86)90029-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：465 / 478

页数：14

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