HOT-ELECTRON EFFECTS ON CHANNEL THERMAL NOISE IN FINE-LINE NMOS FIELD-EFFECT TRANSISTORS

被引:50
作者
JINDAL, RP
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D O I
10.1109/T-ED.1986.22680
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1395 / 1397
页数:3
相关论文
共 10 条
[1]   NOISE TEMPERATURE IN SILICON IN HOT ELECTRON REGION [J].
BAECHTOLD, W .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1971, ED18 (12) :1186-+
[5]   THEORY OF NOISE IN METAL OXIDE SEMICONDUCTOR DEVICES [J].
JORDAN, AG ;
JORDAN, NA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1965, ED12 (03) :148-+
[6]  
KLASSEN FM, 1970, IEEE T ELECTRON DEV, V17, P858
[7]  
TAKAGI K, 1977, SOLID STATE ELECTRON, V20
[8]   RESISTIVE-GATE-INDUCED THERMAL NOISE IN IGFETS [J].
THORNBER, KK .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1981, 16 (04) :414-415
[9]  
VANDERZIEL A, 1970, NOISE SOURCES CHARAC, pCH5
[10]  
VANDERZIEL A, 1962, P IRE, V56, P1808