DEPOSITION AND MEASUREMENTS OF ELECTRON-BEAM-EVAPORATED SIO-CHI ANTIREFLECTION COATINGS ON INGAASP INJECTION-LASER FACETS

被引:23
作者
EISENSTEIN, G [1 ]
RAYBON, G [1 ]
STULZ, LW [1 ]
机构
[1] AT&T BELL LABS,PHOTON CIRCUITS RES DEPT,HOLMDEL,NJ 07733
关键词
D O I
10.1109/50.3955
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:12 / 16
页数:5
相关论文
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