MICROPATTERNING OF HIGH-TC FILMS WITH AN EXCIMER LASER

被引：46

作者：

MANNHART, J

SCHEUERMANN, M

TSUEI, CC

OPRYSKO, MM

CHI, CC

UMBACH, CP

KOCH, RH

MILLER, C

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 15期

关键词：

D O I：

10.1063/1.99678

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：1271 / 1273

页数：3

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