MAGNETRON SPUTTERING AND LASER PATTERNING OF HIGH TRANSITION-TEMPERATURE CU OXIDE-FILMS

被引:48
作者
SCHEUERMANN, M
CHI, CC
TSUEI, CC
YEE, DS
CUOMO, JJ
LAIBOWITZ, RB
KOCH, RH
BRAREN, B
SRINIVASAN, R
PLECHATY, MM
机构
关键词
D O I
10.1063/1.98986
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1951 / 1953
页数:3
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