MORPHOLOGICAL FLUCTUATIONS IN DISCHARGE-PRODUCED MU-C-SI-H STUDIED BY SMALL-ANGLE X-RAY-SCATTERING

被引：6

作者：

MIYAZAKI, S

MISHIMA, Y

HIROSE, M

OSAKA, Y

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1983年 / 59-6卷 / DEC期

关键词：

D O I：

10.1016/0022-3093(83)90288-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：787 / 790

页数：4

共 10 条

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[7] MICROCRYSTALLINE FORMATION IN SPUTTERED A-SI-H-FILMS [J].

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SOLID STATE COMMUNICATIONS, 1983, 45 (07) :577-580

[8] PROPERTIES OF HEAVILY DOPED GD-SI WITH LOW RESISTIVITY [J].

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