INTERDIFFUSION IN FE/CR MULTILAYER THIN-FILMS

被引：1

作者：

NAKAJIMA, H ^{[1
]}

NONAKA, K ^{[1
]}

OBI, Y ^{[1
]}

FUJIMORI, H ^{[1
]}

机构：

[1] TOHOKU UNIV, INST MAT RES, SENDAI, MIYAGI 980, JAPAN

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1993年 / 126卷 / 1-3期

关键词：

D O I：

10.1016/0304-8853(93)90575-M

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Interdiffusion in sputter-deposited Fe/Cr multilayer thin films has been investigated by the Auger electron depth profiling technique over the temperature range 624-723 K. The interdiffusion coefficients were evaluated from the change in the amplitude of the sinusoidal composition distribution. The activation energy for the interdiffusion was determined to be 185 kJ mol-1.

引用

页码：176 / 179

页数：4

共 8 条

[1]

Alberry P. J., 1974, Metal Science, V8, P407

[2] AES DEPTH PROFILE STUDIES OF INTERDIFFUSION IN THE AG-CU BILAYER AND MULTILAYER THIN-FILMS [J].