PHOTOLYSIS OF POLYAMIDES CONTAINING THYMINE PHOTODIMER UNITS IN THE MAIN CHAIN AND APPLICATION TO DEEP-UV POSITIVE TYPE PHOTORESISTS

被引：15

作者：

MOGHADDAM, MJ

INAKI, Y

TAKEMOTO, K

机构：

[1] Department of Applied Fine Chemistry, Osaka University, Osaka

来源：

POLYMER JOURNAL | 1990年 / 22卷 / 06期

关键词：

Deep uv photoresist; High resolution; Photodimerization; Photodissociation; Photoresist; Photosensitivity; Polyamide; Positive type photoresists; Thymine photodimer;

D O I：

10.1295/polymj.22.468

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Polyamides containing thymine photodimer units in the main chain were found to be applicable to a positive-chain scission type photoresist upon deep-UV exposure. Photo-dissociations of cyclobutane-type photodimers of thymine units caused the scission of the polymer chains, leading to decrease in molecular weight of the polymers. Photolithographic sensitivity and resolution test for these polymers indicated good sensitivity values with novel resolution of even 0.3 μm. © 1990, The Society of Polymer Science, Japan. All rights reserved.

引用

页码：468 / 476

页数：9

共 11 条

[1]

FISHER GJ, 1976, PHOTOCHEM PHOTOBIOL, V1, P230

[2]

GRANT BD, 1987, IEEE T ELECTRON DEV, V28, P1300

[3] PROPERTIES OF THYMINE DIMERS [J].