ION PROJECTION LITHOGRAPHY OVER WAFER TOPOGRAPHY

被引：8

作者：

BRUNGER, WH ^{[1
]}

BUCHMANN, LM ^{[1
]}

TORKLER, MA ^{[1
]}

FINKELSTEIN, W ^{[1
]}

机构：

[1] ADV LITHOG GRP,COLUMBIA,MD 21045

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587468

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3547 / 3549

页数：3

共 6 条

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[2] [Anonymous], 1977, STOPPING RANGES IONS
[3] FABRICATION OF 3.5-GHZ SURFACE ACOUSTIC-WAVE FILTERS BY ION PROJECTION LITHOGRAPHY
BRUNGER, WH
BUCHMANN, LM
KREUTZER, M
TORKLER, M
ZWICKER, G
FLEISCHMANN, B
[J]. MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 245 - 248
[4] Buchmann L.-M., 1992, Journal of Microelectromechanical Systems, V1, P116, DOI 10.1109/84.186390
[5] ION-BEAM EXPOSURE PROFILES IN PMMA-COMPUTER SIMULATION
KARAPIPERIS, L
ADESIDA, I
LEE, CA
WOLF, ED
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1259 - 1263
[6] A STATISTICAL-ANALYSIS OF ULTRAVIOLET, X-RAY, AND CHARGED-PARTICLE LITHOGRAPHIES
SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 148 - 153