STRAIN BROADENING OF THE DANGLING-BOND RESONANCE AT THE (111)SI-SIO2 INTERFACE

被引:94
作者
BROWER, KL
机构
来源
PHYSICAL REVIEW B | 1986年 / 33卷 / 07期
关键词
D O I
10.1103/PhysRevB.33.4471
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:4471 / 4478
页数:8
相关论文
共 33 条
[1]  
Brower K. L., 1985, Thirteenth International Conference on Defects in Semiconductors, P485
[2]   EPR TECHNIQUES FOR STUDYING DEFECTS IN SILICON [J].
BROWER, KL .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (02) :135-141
[3]   SI-29 HYPERFINE-STRUCTURE OF UNPAIRED SPINS AT THE SI/SIO2 INTERFACE [J].
BROWER, KL .
APPLIED PHYSICS LETTERS, 1983, 43 (12) :1111-1113
[4]   DEFECTS AND IMPURITIES IN THERMAL OXIDES ON SILICON [J].
BROWER, KL ;
LENAHAN, PM ;
DRESSENDORFER, PV .
APPLIED PHYSICS LETTERS, 1982, 41 (03) :251-253
[5]   ELECTRON-PARAMAGNETIC RESONANCE OF AL E1' CENTERS IN VITREOUS SILICA [J].
BROWER, KL .
PHYSICAL REVIEW B, 1979, 20 (05) :1799-1811
[6]   EPR OF A [001] SI INTERSTITIAL COMPLEX IN IRRADIATED SILICON [J].
BROWER, KL .
PHYSICAL REVIEW B, 1976, 14 (03) :872-883
[7]   ELECTRON-SPIN-RESONANCE STUDIES OF THERMALLY OXIDIZED SILICON-WAFERS [J].
BRUNSTROM, C ;
SVENSSON, C .
SOLID STATE COMMUNICATIONS, 1981, 37 (05) :399-404
[8]   ESR CENTERS, INTERFACE STATES, AND OXIDE FIXED CHARGE IN THERMALLY OXIDIZED SILICON WAFERS [J].
CAPLAN, PJ ;
POINDEXTER, EH ;
DEAL, BE ;
RAZOUK, RR .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) :5847-5854
[9]  
COULSON CA, 1961, VALENCE, P203
[10]  
Edwards A. H., 1985, Thirteenth International Conference on Defects in Semiconductors, P491