TITANIUM-DIOXIDE PHOTOCATALYSTS PRODUCED BY REACTIVE MAGNETRON SPUTTERING

被引：111

作者：

WEINBERGER, BR

GARBER, RB

机构：

[1] United Technologies Research Center

来源：

APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 18期

关键词：

D O I：

10.1063/1.113956

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A process is described for the deposition of anatase titanium dioxide films by reactive magnetron sputtering. The films have a porous columnar morphology with a high effective surface area making them well suited to be used as photocatalysts. Data are presented on the use of such films in the photocatalytic decomposition of gas phase pollutants in air.© 1995 American Institute of Physics.

引用

页码：2409 / 2411

页数：3

共 18 条

[1]

[Anonymous], 1993, P 1 INT C TIO2 PHOT

[2] EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES [J].