THERMAL-OXIDATION OF REACTIVELY SPUTTERED TITANIUM NITRIDE AND HAFNIUM NITRIDE FILMS

被引：80

作者：

SUNI, I

SIGURD, D

HO, KT

NICOLET, MA

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 05期

关键词：

D O I：

10.1149/1.2119919

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1210 / 1214

页数：5

共 23 条

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[5]

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[9]

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[10]

Hauffe K., 1965, OXID MET, P209

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