ON THE VACANCY FORMATION AND DIFFUSION ON THE SI(111)7 X 7 SURFACES UNDER EXPOSURES OF LOW OXYGEN-PRESSURE STUDIED BY INSITU REFLECTION ELECTRON-MICROSCOPY

被引：39

作者：

SHIMIZU, N ^{[1
]}

TANISHIRO, Y ^{[1
]}

TAKAYANAGI, K ^{[1
]}

YAGI, K ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,DEPT PHYS,MEGURO KU,TOKYO 152,JAPAN

来源：

SURFACE SCIENCE | 1987年 / 191卷 / 1-2期

关键词：

D O I：

10.1016/S0039-6028(87)81046-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：28 / 44

页数：17

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