REDUCTION OF LONG-TERM TRANSIENT RADIATION RESPONSE IN ION-IMPLANTED GAAS-FETS

被引:20
作者
ANDERSON, WT
SIMONS, M
KING, EE
DIETRICH, HB
LAMBERT, RJ
机构
关键词
D O I
10.1109/TNS.1982.4336399
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1533 / 1538
页数:6
相关论文
共 7 条
[1]   STABILITY OF PERFORMANCE AND INTERFACIAL PROBLEMS IN GAAS-MESFETS [J].
ITOH, T ;
YANAI, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (06) :1037-1045
[2]  
ITOH T, 1979, I PHYS C SER, V45, P326
[3]  
KING EE, 1981, Patent No. 65548
[4]  
Milnes A., 1973, DEEP IMPURITIES SEMI
[5]   SUB-MICRON GATE GAAS MESFETS WITH ION-IMPLANTED CHANNELS [J].
NOZAKI, T ;
OHATA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 :111-114
[6]   LONG-TERM RADIATION TRANSIENTS IN GAAS-FETS [J].
SIMONS, M ;
KING, EE .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1979, 26 (06) :5080-5086
[7]   TRANSIENT RADIATION STUDY OF GAAS METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS IMPLANTED IN CR-DOPED AND UNDOPED SUBSTRATES [J].
SIMONS, M ;
KING, EE ;
ANDERSON, WT ;
DAY, HM .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6630-6636