PREPARATION AND PROPERTIES OF AMORPHOUS BORON-NITRIDE FILMS BY MOLECULAR-FLOW CHEMICAL VAPOR-DEPOSITION

被引：37

作者：

NAKAMURA, K

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 07期

关键词：

D O I：

10.1149/1.2114206

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1757 / 1762

页数：6

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