GEOMETRIC MODELING OF THE DIAMOND BETA-SIC HETEROEPITAXIAL INTERFACE

被引:5
作者
ZHU, W
WANG, XH
STONER, BR
KONG, HS
BRAUN, MWH
GLASS, JT
机构
[1] Department of Materials Science and Engineering, North Carolina State University, Raleigh
关键词
D O I
10.1016/0925-9635(93)90127-N
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A theoretical study of the diamond-beta-SiC heteroepitaxial interface has been conducted. The interfacial modeling was performed to examine the various combinations of like and unlike interfacial planes between diamond and beta-SiC based on a geometric criterion formulated in reciprocal space for minimization of interfacial misfit and strain energies. The modeling results indicated that the low index, unlike pair between diamond{114} and beta-SiC{221} has the greatest potential for minimizing the interfacial energy and, therefore, is strongly recommended for experimental investigations. The low index, like pairs between diamond and beta-SiC are next in potential, and diamond{100}-beta-SiC{100} heteroepitaxy has been confirmed experimentally. Other configurations yield high interfacial energies and are unlikely to occur in reality. The relatively high strain energy associated with the like pair heteroepitaxy can be relieved by the introduction of misfit dislocations at the interface. The calculated misfit dislocation densities agree well with the experimental measurements.
引用
收藏
页码:590 / 596
页数:7
相关论文
共 55 条
[1]   STRUCTURE AND GROWTH OF CRYSTALLINE SUPERLATTICES - FROM MONOLAYER TO SUPERLATTICE [J].
BAUER, E ;
VANDERMERWE, JH .
PHYSICAL REVIEW B, 1986, 33 (06) :3657-3671
[2]  
BEAN JC, 1987, MRS S P, V91, P269
[3]   EPITAXIAL CDTE-FILMS ON GAAS/SI AND GAAS SUBSTRATES [J].
BEAN, RC ;
ZANIO, KR ;
HAY, KA ;
WRIGHT, JM ;
SALLER, EJ ;
FISCHER, R ;
MORKOC, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (04) :2153-2157
[4]  
BRAUN MWH, 1988, S AFR J SCI, V84, P670
[5]   THE ROLE OF GEOMETRIC CONSIDERATIONS IN THE DIAMOND-CUBIC BORON-NITRIDE HETEROEPITAXIAL SYSTEM [J].
BRAUN, MWH ;
KONG, HS ;
GLASS, JT ;
DAVIS, RF .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (04) :2679-2681
[6]  
BRAUN MWH, 1987, THESIS U PRETORIA
[7]  
CHEN XK, 1991, 2ND P INT S DIAM MAT, P73
[8]   SURFACTANTS IN EPITAXIAL-GROWTH [J].
COPEL, M ;
REUTER, MC ;
KAXIRAS, E ;
TROMP, RM .
PHYSICAL REVIEW LETTERS, 1989, 63 (06) :632-635
[9]   THIN-FILM DEPOSITION AND MICROELECTRONIC AND OPTOELECTRONIC DEVICE FABRICATION AND CHARACTERIZATION IN MONOCRYSTALLINE ALPHA AND BETA SILICON-CARBIDE [J].
DAVIS, RF ;
KELNER, G ;
SHUR, M ;
PALMOUR, JW ;
EDMOND, JA .
PROCEEDINGS OF THE IEEE, 1991, 79 (05) :677-701
[10]  
DAVIS RF, 1991, ADV SOLID STATE CHEM, V2, P1