AN XPS STUDY OF THE EFFECTS OF CF4 PLASMAS ON GOLD SURFACES

被引：12

作者：

LINN, JH ^{[1
]}

SWARTZ, WE ^{[1
]}

机构：

[1] UNIV S FLORIDA,DEPT CHEM,TAMPA,FL 33620

来源：

APPLIED SPECTROSCOPY | 1985年 / 39卷 / 05期

关键词：

GOLD SURFACES - MODIFIED SURFACE - PLASMA ETCHING;

D O I：

10.1366/0003702854249899

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：755 / 760

页数：6

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