DETERMINATION OF THE FE/SI(111) PHASE-DIAGRAM BY MEANS OF PHOTOELECTRON SPECTROSCOPIES

被引：29

作者：

ALVAREZ, J

HINAREJOS, JJ

MICHEL, EG

MIRANDA, R

机构：

[1] Departamento de Física de la Materia Condensada C-III, Universidad Autónoma de Madrid

来源：

SURFACE SCIENCE | 1993年 / 287卷 / pt A期

关键词：

18;

D O I：

10.1016/0039-6028(93)90828-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have determined by means of photoelectron spectroscopies the coverage-temperature phase diagram for the Fe/Si(111) system. A Fe thin film of varying coverage was deposited on a Si(111) substrate and annealed to increasingly higher temperatures to produce the different iron silicides studied. Together with the well known bulk phases epsilon-FeSi and beta-FeSi2, the less common Fe3Si phase has been characterized. In addition, a surface-stabilized phase (gamma-FeSi2) has been observed, and its stoichiometry, electronic structure and stability range have been determined. These results are relevant to understand the surface epitaxy of iron silicides on semiconducting substrates.

引用

页码：490 / 494

页数：5

共 19 条

[1] ELECTRONIC-STRUCTURE OF IRON SILICIDES GROWN ON SI(100) DETERMINED BY PHOTOELECTRON SPECTROSCOPIES [J].