POLYSILICON SOURCE AND DRAIN MOS-TRANSISTOR (PSD MOST)

被引:4
作者
MIDDELHOEK, J [1 ]
KOOY, A [1 ]
机构
[1] TWENTE UNIV TECHNOL,DEPT ELECT ENGN,ENSCHEDE,NETHERLANDS
关键词
D O I
10.1109/T-ED.1976.18442
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:523 / 525
页数:3
相关论文
共 3 条
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SOLID-STATE ELECTRONICS, 1969, 12 (05) :305-+
[2]   INFLUENCE OF ASH3, PH3, AND B2H6 ON GROWTH-RATE AND RESISTIVITY OF POLYCRYSTALLINE SILICON FILMS DEPOSITED FROM A SIH4-H2 MIXTURE [J].
EVERSTEY.FC ;
PUT, BH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) :106-110
[3]   METHOD FOR MEASUREMENT OF TURN-ON CONDITION IN MOS TRANSISTORS [J].
WALLINGA, H .
SOLID-STATE ELECTRONICS, 1971, 14 (11) :1093-&