MODELING IMAGE-FORMATION - APPLICATION TO MASK OPTIMIZATION

被引：15

作者：

XIAO, JB ^{[1
]}

KHAN, M ^{[1
]}

NACHMAN, R ^{[1
]}

WALLACE, J ^{[1
]}

CHEN, Z ^{[1
]}

CERRINA, F ^{[1
]}

机构：

[1] UNIV WISCONSIN,CTR XRAY LITHOG,MADISON,WI 53706

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587426

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：4038 / 4043

页数：6

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