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A SIMPLE OPTICAL-DEVICE FOR GENERATING SQUARE FLAT-TOP INTENSITY IRRADIATION FROM A GAUSSIAN LASER-BEAM
被引:47
作者
:
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
ITAGAKI, Y
论文数:
0
引用数:
0
h-index:
0
ITAGAKI, Y
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
机构
:
来源
:
OPTICS COMMUNICATIONS
|
1983年
/ 48卷
/ 01期
关键词
:
D O I
:
10.1016/0030-4018(83)90246-8
中图分类号
:
O43 [光学];
学科分类号
:
070207 ;
0803 ;
摘要
:
引用
收藏
页码:44 / 46
页数:3
相关论文
共 8 条
[1]
DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
JOURNAL OF APPLIED PHYSICS,
1982,
53
(09)
:6489
-6490
[2]
BEAM QUALITY OF A KRF LASER PUMPED BY AN ANNULAR ELECTRON-BEAM
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
SUZUKI, K
论文数:
0
引用数:
0
h-index:
0
SUZUKI, K
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
OPTICS COMMUNICATIONS,
1982,
43
(02)
:134
-136
[3]
AN ANNULAR ELECTRON-BEAM FOR LONGITUDINAL ELECTRON-BEAM PUMPED HIGH-POWER LASERS
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
NAMBA, S
;
SUZUKI, K
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
SUZUKI, K
.
APPLIED PHYSICS LETTERS,
1982,
40
(11)
:924
-925
[4]
EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
APPLIED PHYSICS LETTERS,
1982,
40
(05)
:374
-375
[5]
LOCALIZED LASER ETCHING OF COMPOUND SEMICONDUCTORS IN AQUEOUS-SOLUTION
[J].
OSGOOD, RM
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
OSGOOD, RM
;
SANCHEZRUBIO, A
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
SANCHEZRUBIO, A
;
EHRLICH, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
EHRLICH, DJ
;
DANEU, V
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
DANEU, V
.
APPLIED PHYSICS LETTERS,
1982,
40
(05)
:391
-393
[6]
SHAFER D, 1982, OPTICS LASER TECHNOL, V159
[7]
TECHNIQUE FOR GENERATING FOCAL-PLANE FLAT-TOP LASER-BEAM PROFILES
[J].
VELDKAMP, WB
论文数:
0
引用数:
0
h-index:
0
VELDKAMP, WB
.
REVIEW OF SCIENTIFIC INSTRUMENTS,
1982,
53
(03)
:294
-297
[8]
1982, LASER FOCUS, V43
←
1
→
共 8 条
[1]
DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
JOURNAL OF APPLIED PHYSICS,
1982,
53
(09)
:6489
-6490
[2]
BEAM QUALITY OF A KRF LASER PUMPED BY AN ANNULAR ELECTRON-BEAM
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
SUZUKI, K
论文数:
0
引用数:
0
h-index:
0
SUZUKI, K
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
OPTICS COMMUNICATIONS,
1982,
43
(02)
:134
-136
[3]
AN ANNULAR ELECTRON-BEAM FOR LONGITUDINAL ELECTRON-BEAM PUMPED HIGH-POWER LASERS
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
NAMBA, S
;
SUZUKI, K
论文数:
0
引用数:
0
h-index:
0
机构:
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
KEIO UNIV,FAC ENGN,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN
SUZUKI, K
.
APPLIED PHYSICS LETTERS,
1982,
40
(11)
:924
-925
[4]
EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER
[J].
KAWAMURA, Y
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, Y
;
TOYODA, K
论文数:
0
引用数:
0
h-index:
0
TOYODA, K
;
NAMBA, S
论文数:
0
引用数:
0
h-index:
0
NAMBA, S
.
APPLIED PHYSICS LETTERS,
1982,
40
(05)
:374
-375
[5]
LOCALIZED LASER ETCHING OF COMPOUND SEMICONDUCTORS IN AQUEOUS-SOLUTION
[J].
OSGOOD, RM
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
OSGOOD, RM
;
SANCHEZRUBIO, A
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
SANCHEZRUBIO, A
;
EHRLICH, DJ
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
EHRLICH, DJ
;
DANEU, V
论文数:
0
引用数:
0
h-index:
0
机构:
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
MIT, LINCOLN LAB, LEXINGTON, MA 02173 USA
DANEU, V
.
APPLIED PHYSICS LETTERS,
1982,
40
(05)
:391
-393
[6]
SHAFER D, 1982, OPTICS LASER TECHNOL, V159
[7]
TECHNIQUE FOR GENERATING FOCAL-PLANE FLAT-TOP LASER-BEAM PROFILES
[J].
VELDKAMP, WB
论文数:
0
引用数:
0
h-index:
0
VELDKAMP, WB
.
REVIEW OF SCIENTIFIC INSTRUMENTS,
1982,
53
(03)
:294
-297
[8]
1982, LASER FOCUS, V43
←
1
→