PHOTOCHEMICAL-REACTIONS IN GEO2-SIO2 GLASSES INDUCED BY ULTRAVIOLET-IRRADIATION - COMPARISON BETWEEN HG LAMP AND EXCIMER-LASER

被引:151
作者
NISHII, J [1 ]
FUKUMI, K [1 ]
YAMANAKA, H [1 ]
KAWAMURA, KI [1 ]
HOSONO, H [1 ]
KAWAZOE, H [1 ]
机构
[1] TOKYO INST TECHNOL,ENGN MAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN
来源
PHYSICAL REVIEW B | 1995年 / 52卷 / 03期
关键词
D O I
10.1103/PhysRevB.52.1661
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
GeO2-SiO2 glasses prepared by vapor-phase axial deposition were exposed to ultraviolet (uv) radiation from a Hg discharge lamp (4.9 eV) and excimer lasers (KrF laser: 5.0 eV, XeCl laser: 4.0 eV). Two photochemical reaction channels were ascertained: (1) The exposure of the glasses to the Hg lamp radiation (similar to 16 mW/cm(2)) induced Ge E' centers accompanied by bleaching of the absorption band due to oxygen-deficient defects near 5 eV (5-eV band) and the emergence of an intense band near 6.4 eV. (2) The irradiation with KrF and XeCl lasers (power densities of 10 and 90 mJ/cm(2)/pulse, respectively, pulse duration of 20 ns) generated two types of paramagnetic defects, electron trapped centers associated with fourfold coordinated Ge ions (GEC) and a self-trapped hole center (STH: bridging oxygen trapping a hole). The former and the latter were considered to be caused via one-photon and two-photon absorption processes, respectively. These alternative reactions proceeded independently depending on the power densities of uv photons. The formation of GEC's was saturated easily by irradiation with KrF laser pulses, and then the conversion of GEC to Ge E' centers was caused by prolonged irradiation.
引用
收藏
页码:1661 / 1665
页数:5
相关论文
共 19 条
[11]   CHARACTERISTICS OF 5-EV ABSORPTION-BAND IN SPUTTER-DEPOSITED GEO2-SIO2 THIN GLASS-FILMS [J].
NISHII, J ;
YAMANAKA, H ;
HOSONO, H ;
KAWAZOE, H .
APPLIED PHYSICS LETTERS, 1994, 64 (03) :282-284
[12]  
NISHII J, IN PRESS OPT LETT
[13]   DYNAMIC AND ORIENTATIONAL BEHAVIOR OF UV-INDUCED LUMINESCENCE BLEACHING IN GE-DOPED SILICA OPTICAL-FIBER [J].
POIRIER, M ;
THIBAULT, S ;
LAUZON, J ;
OUELLETTE, F .
OPTICS LETTERS, 1993, 18 (11) :870-872
[14]   OPTICAL-PROPERTIES OF GEO2 [J].
RAVINDRA, NM ;
WEEKS, RA ;
KINSER, DL .
PHYSICAL REVIEW B, 1987, 36 (11) :6132-6134
[15]  
STRUSSELL P, 1991, P SOC PHOTO-OPT INS, V1516, P47
[16]  
Tsai T.E., 1987, DIFFUS DEFECT DATA B, V53, P469, DOI [10.4028/www.scientific.net/DDF.53-54.469, DOI 10.4028/WWW.SCIENTIFIC.NET/DDF.53-54.469]
[17]   RADIATION-INDUCED DEFECT CENTERS IN HIGH-PURITY GEO2 GLASS [J].
TSAI, TE ;
GRISCOM, DL ;
FRIEBELE, EJ ;
FLEMING, JW .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (06) :2264-2268
[18]   STRUCTURE AND MECHANISM OF FORMATION OF DRAWING-INDUCED OR RADIATION-INDUCED DEFECTS IN SIO2-GEO2 OPTICAL FIBER [J].
WATANABE, Y ;
KAWAZOE, H ;
SHIBUYA, K ;
MUTA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1986, 25 (03) :425-431
[19]  
WEINBERG ZA, 1979, PHYS REV B, V19, P3107, DOI 10.1103/PhysRevB.19.3107