CHARACTERIZATION OF PLASMA-DEPOSITED ORGANO-SILICON THIN-FILMS

被引：19

作者：

SACHDEV, KG

SACHDEV, HS

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] IBM CORP,POUGHKEEPSIE,NY 12602

来源：

THIN SOLID FILMS | 1983年 / 107卷 / 03期

关键词：

D O I：

10.1016/0040-6090(83)90403-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：245 / 250

页数：6

相关论文

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