ELECTRON SPIN RESONANCE IN SIO2 GROWN ON SILICON

被引：48

作者：

NISHI, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1966年 / 5卷 / 04期

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D O I：

10.1143/JJAP.5.333

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：333 / &

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