OXYGEN-RELATED THERMAL DONORS IN SILICON - A NEW STRUCTURAL AND KINETIC-MODEL

被引：191

作者：

OURMAZD, A ^{[1
]}

SCHROTER, W ^{[1
]}

BOURRET, A ^{[1
]}

机构：

[1] UNIV GOTTINGEN,INST MET PHYS,D-3400 GOTTINGEN,FED REP GER

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 06期

关键词：

D O I：

10.1063/1.334156

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1670 / 1681

页数：12

共 23 条

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[9]

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