RUTHERFORD BACKSCATTERING SPECTROSCOPY AND ELECTRON-MICROPROBE ANALYSES OF ARGON GAS TRAPPED IN ALUMINA THIN-FILMS

被引：4

作者：

GIGNAC, LM

RISBUD, SH

机构：

来源：

关键词：

D O I：

10.1063/1.101439

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：129 / 130

页数：2

共 17 条

[11]

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[12]

OBLAS DW, 1968, J APPL PHYS, V29, P6106

[13] ARGON CONTENT OF SIO2 FILMS DEPOSITED BY RF SPUTTERING IN ARGON [J].

SCHWARTZ, GC ;

JONES, RE .

THORNTON, JA ;

TABOCK, J ;

HOFFMAN, DW .

[15]

Willich P., 1986, Philips Technical Review, V42, P162

[16] GAS INCORPORATION INTO SPUTTERED FILMS [J].

WINTERS, HF ;

KAY, E .

[17]

WINTERS HF, 1974, J APPL PHYS, V43, P789