GETTERS AS PLASMA REAGENTS IN GLOW-DISCHARGE MASS-SPECTROMETRY

被引:40
作者
MEI, Y
HARRISON, WW
机构
[1] Department of Chemistry, University of Florida, Gainesville
关键词
D O I
10.1016/0584-8547(91)80020-4
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Plasma modification studies are carried out using getter reagents as sample matrices in analyzing lanthanum oxide with glow discharge mass spectrometry. Five metals with varying gettering abilities, Ti, Ta, W, C and Ag, are evaluated with respect to removing gaseous interferences from the discharge and enhancing the atomic population of the analyte. Getting action is considered proportional to the metal's sputter yield and its affinity toward oxygen.
引用
收藏
页码:175 / 182
页数:8
相关论文
共 15 条
[1]  
BARSHICK CM, 1989, FACSS CHICAGO
[2]  
Coburn J. W., 1974, Japanese Journal of Applied Physics, P501
[3]  
GIORGI TA, 1974, JAPAN J APPL PHY 1 S, V2, P53
[4]  
HARRISON WW, 1988, PROG ANAL SPECTROSC, V11, P53
[5]   GETTER SPUTTERING - REVIEW [J].
HOLLAND, L ;
COX, REL .
VACUUM, 1974, 24 (03) :107-116
[6]   STUDY OF MOLECULAR INTERFERENCES IN GLOW-DISCHARGE MASS-SPECTROMETRY [J].
KING, FL ;
MCCORMACK, AL ;
HARRISON, WW .
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1988, 3 (06) :883-886
[7]   SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].
LAEGREID, N ;
WEHNER, GK .
JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&
[8]  
LOVING TJ, 1903, ANAL CHEM, V54, P1526
[9]  
Mei Y., UNPUB
[10]   SPUTTERING OF TA2O5 BY AR+ IONS AT ENERGIES BELOW 1-KEV [J].
OECHSNER, H ;
SCHOOF, H ;
STUMPE, E .
SURFACE SCIENCE, 1978, 76 (02) :343-354