A NEW APPROACH TO THE HIGH-RESOLUTION ELECTRODEPOSITION OF METALS VIA THE FEEDBACK MODE OF THE SCANNING ELECTROCHEMICAL MICROSCOPE

被引:83
作者
MANDLER, D
BARD, AJ
机构
[1] Department of Chemistry, The University of Texas at Austin, Austin
关键词
High Resolution Electrodeposition - Scanning Electrochemical;
D O I
10.1149/1.2086606
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Gold and palladium electrodeposition in polymer films immersed in solution with high resolution has been accomplished using the scanning electrochemical microscope (SECM). The SECM was used in the feedback mode, where hexaamminoruthenium(III), Ru(NH3)63+, was reduced at an ultramicroelectrode (UME) and diffused to a protonated polyvinyl pyridine-coated surface. When metal anions, e.g., AuCl4- or PdCl42, were incorporated in the polymeric matrix, the diffusion of reduced mediator, Ru(NH3)2+, from the UME to the polymer film resulted in metal deposition. The different factors that determine the size and pattern of deposited metal were examined. The difference between gold and palladium deposition was studied by several techniques and interpreted in terms of kinetic and thermodynamic properties of the mediator and the metal complex. © 1990, The Electrochemical Society, Inc. All rights reserved.
引用
收藏
页码:1079 / 1086
页数:8
相关论文
共 29 条
[1]   SURFACE MODIFICATION WITH THE SCANNING TUNNELING MICROSCOPE [J].
ABRAHAM, DW ;
MAMIN, HJ ;
GANZ, E ;
CLARKE, J .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1986, 30 (05) :492-499
[2]  
[Anonymous], MICROELECTRONICS PRO
[3]   SCANNING ELECTROCHEMICAL MICROSCOPY - INTRODUCTION AND PRINCIPLES [J].
BARD, AJ ;
FAN, FRF ;
KWAK, J ;
LEV, O .
ANALYTICAL CHEMISTRY, 1989, 61 (02) :132-138
[4]   NANOSTRUCTURE TECHNOLOGY [J].
CHANG, THP ;
KERN, DP ;
KRATSCHMER, E ;
LEE, KY ;
LUHN, HE ;
MCCORD, MA ;
RISHTON, SA ;
VLADIMIRSKY, Y .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) :462-493
[5]   HIGH-RESOLUTION DEPOSITION OF SILVER IN NAFION FILMS WITH THE SCANNING TUNNELING MICROSCOPE [J].
CRASTON, DH ;
LIN, CW ;
BARD, AJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) :785-786
[6]  
Elliott DJ, 1986, MICROLITHOGRAPHY PRO
[7]  
Fleishmann M., 1987, ULTRAMICROELECTRODES
[8]   MATERIALS AND PROCESSES FOR MICROSTRUCTURE FABRICATION [J].
HATZAKIS, M .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1988, 32 (04) :441-453
[9]   HIGH-RESOLUTION DEPOSITION AND ETCHING OF METALS WITH A SCANNING ELECTROCHEMICAL MICROSCOPE [J].
HUSSER, OE ;
CRASTON, DH ;
BARD, AJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :1873-1876
[10]  
HUSSER OH, 1989, J ELECTROCHEM SOC, V36, P3222