SCHOTTKY BARRIERS - MODELS AND TESTS

被引:24
作者
FREEOUF, JL
机构
关键词
D O I
10.1016/0039-6028(83)90540-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
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页码:233 / 249
页数:17
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  • [1] PHOTOEMISSION INVESTIGATION OF THE TEMPERATURE EFFECT ON SI-AU INTERFACES
    ABBATI, I
    BRAICOVICH, L
    FRANCIOSI, A
    LINDAU, I
    SKEATH, PR
    SU, CY
    SPICER, WE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05): : 930 - 935
  • [2] WORK FUNCTION, PHOTOELECTRIC THRESHOLD, AND SURFACE STATES OF ATOMICALLY CLEAN SILICON
    ALLEN, FG
    GOBELI, GW
    [J]. PHYSICAL REVIEW, 1962, 127 (01): : 150 - &
  • [3] ROLE OF SURFACE ANTISITE DEFECTS IN THE FORMATION OF SCHOTTKY BARRIERS
    ALLEN, RE
    DOW, JD
    [J]. PHYSICAL REVIEW B, 1982, 25 (02): : 1423 - 1426
  • [4] CHEMICAL BONDING AND STRUCTURE OF METAL-SEMICONDUCTOR INTERFACES
    ANDREWS, JM
    PHILLIPS, JC
    [J]. PHYSICAL REVIEW LETTERS, 1975, 35 (01) : 56 - 59
  • [5] ANGULAR-DEPENDENCE OF X-RAY-PHOTOEMITTED VALENCE-ELECTRON SPECTRA FROM SINGLE-CRYSTAL GOLD
    BAIRD, RJ
    WAGNER, LF
    FADLEY, CS
    [J]. PHYSICAL REVIEW LETTERS, 1976, 37 (02) : 111 - 114
  • [6] SURFACE STATES AND RECTIFICATION AT A METAL SEMI-CONDUCTOR CONTACT
    BARDEEN, J
    [J]. PHYSICAL REVIEW, 1947, 71 (10): : 717 - 727
  • [7] DISSOCIATIVE SURFACE-REACTIONS AT SCHOTTKY AND HETEROJUNCTION INTERFACES WITH ALAS AND GAAS
    BAUER, RS
    BACHRACH, RZ
    HANSSON, GV
    CHIARADIA, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 674 - 680
  • [8] BRILLSON LJ, 1978, J VAC SCI TECHNOL, V15, P1378, DOI 10.1116/1.569792
  • [9] REACTIVE INTER-DIFFUSION AND ELECTRONIC BARRIERS AT METAL-CDS AND METAL-CDSE INTERFACES - CONTROL OF SCHOTTKY-BARRIER HEIGHT USING REACTIVE INTERLAYERS
    BRUCKER, CF
    BRILLSON, LJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03): : 617 - 622
  • [10] BRUCKER CF, COMMUNICATION