SOME ELECTRICAL MEASUREMENTS ON GASEOUS ION-IMPLANTED METALLIC AND INSULATING THIN-FILMS

被引：15

作者：

OGALE, SB

GHAISAS, SV

OGALE, AS

BHIDAY, MR

NIGAVEKAR, AS

BHORASKAR, VN

机构：

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1982年 / 63卷 / 1-4期

关键词：

D O I：

10.1080/00337578208222828

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

页码：73 / 80

页数：8

共 10 条

[1]

ALBIN S, 1976, THESIS U POONA

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BELSON, J ;

WILSON, IH .

THIN SOLID FILMS, 1978, 55 (01) :61-66

[3]

CARTER G, 1975, C SERIES I PHYSICS, V28

[4]

Crowder Billy L., 1973, ION IMPLANTATION SEM

[5] REACTIVE ION-BOMBARDMENT OF TANTALUM THIN-FILM RESISTORS [J].

DEERY, M ;

GOH, KH ;

STEPHENS, KG ;

WILSON, IH .

THIN SOLID FILMS, 1973, 17 (01) :59-66

[6]

Mayer J. W., 1970, ION IMPLANTATION SEM

[7]

OGALE SB, 1 U POON DEP PHYS TE

[8]

RUGE I, 1970, 2ND INT C ION IMPL S

[9] PROPERTIES AND APPLICATIONS OF ION-IMPLANTED FILMS [J].

STEPHENS, KG ;

WILSON, IH .

THIN SOLID FILMS, 1978, 50 (MAY) :325-347

[10] CHANGES IN PHASE STRUCTURE AND FORMATION OF CHEMICAL COMPOUNDS BY ION-IMPLANTATION OF TANTALUM THIN-FILMS [J].

WILSON, IH ;

GOH, KH ;

STEPHENS, KG .

THIN SOLID FILMS, 1976, 33 (02) :205-218

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