ELECTRON-BEAM PROXIMITY PRINTING - A NEW HIGH-SPEED LITHOGRAPHY METHOD FOR SUB-MICRON STRUCTURES

被引：21

作者：

BOHLEN, H

GRESCHNER, J

KEYSER, J

KULCKE, W

NEHMIZ, P

机构：

来源：

关键词：

D O I：

10.1147/rd.265.0568

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：568 / 579

页数：12

共 14 条

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