MECHANISMS OF EQUILIBRIUM AND NONEQUILIBRIUM DIFFUSION OF DOPANTS IN SILICON

被引：72

作者：

NICHOLS, CS

VAN DE WALLE, CG

PANTELIDES, ST

机构：

来源：

PHYSICAL REVIEW LETTERS | 1989年 / 62卷 / 09期

关键词：

D O I：

10.1103/PhysRevLett.62.1049

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1049 / 1052

页数：4

共 20 条

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