STUDY OF AMORPHOUS GE-SIO2-P+SI TUNNEL-JUNCTIONS

被引：5

作者：

NAKASHITA, T ^{[1
]}

HIROSE, M ^{[1
]}

OSAKA, Y ^{[1
]}

机构：

[1] HIROSHIMA UNIV,FAC ENGN,DEPT ELECT ENGN,HIROSHIMA,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1976年 / 22卷 / 01期

关键词：

D O I：

10.1016/0022-3093(76)90006-5

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：45 / 56

页数：12

共 16 条

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[7]

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