SPUTTER-ENHANCED DIFFUSION PHENOMENA IN CU/NI ALLOYS AT ELEVATED-TEMPERATURES

被引：38

作者：

SHIMIZU, H ^{[1
]}

ONO, M ^{[1
]}

KOYAMA, N ^{[1
]}

ISHIDA, Y ^{[1
]}

机构：

[1] UNIV TOKYO,INST IND SCI,TOKYO 106,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 04期

关键词：

D O I：

10.1063/1.331048

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3044 / 3052

页数：9

共 38 条

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[2]

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[3]

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[4]

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[5] DIFFUSION ENHANCEMENT DUE TO LOW-ENERGY ION-BOMBARDMENT DURING SPUTTER ETCHING AND DEPOSITION [J].

ELTOUKHY, AH ;

GREENE, JE .

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[6]

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[7]

GREEN DM, 1980, PLASMA CHEM, V1, P45

[8] OBSERVATION OF SEGREGATION OF CU TO SURFACE OF A CLEAN, ANNEALED, 50 PERCENT CU-50 PERCENT NI-ALLOY BY AUGER-ELECTRON SPECTROSCOPY [J].

HELMS, CR .

JOURNAL OF CATALYSIS, 1975, 36 (01) :114-117

[9] AUGER STUDY OF PREFERRED SPUTTERING ON BINARY ALLOY SURFACES [J].

HO, PS ;

LEWIS, JE ;

WILDMAN, HS ;

HOWARD, JK .

SURFACE SCIENCE, 1976, 57 (01) :393-405

[10]

ISHIDA Y, UNPUB

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