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GAS-PHASE COMPOSITION AND EXTRANEOUS DEPOSITION IN GAAS VAPOR EPITAXY
被引:15
作者
:
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC,DALLAS,TX 75222
TEXAS INSTR INC,DALLAS,TX 75222
SHAW, DW
[
1
]
机构
:
[1]
TEXAS INSTR INC,DALLAS,TX 75222
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1976年
/ 35卷
/ 01期
关键词
:
D O I
:
10.1016/0022-0248(76)90236-0
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:1 / 9
页数:9
相关论文
共 12 条
[1]
CHANE JP, 1972, J CRYST GROWTH, V13, P336
[2]
IIDA S, 1972, J CRYST GROWTH, V13, P325
[3]
ANISOTROPY IN ETCHING AND DEPOSITION OF SELECTIVE EPITAXIAL GROWTH OF GAAS
ISIBASHI, Y
论文数:
0
引用数:
0
h-index:
0
ISIBASHI, Y
YAMAGUCHI, M
论文数:
0
引用数:
0
h-index:
0
YAMAGUCHI, M
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1970,
9
(08)
: 1007
-
+
[4]
ISIBASHI Y, 1971, JPN J APPL PHYS, V10, P525
[5]
APPLICATION OF FINITE ELEMENT METHOD TO MASS TRANSPORT LIMITED EPITAXIAL GROWTH PROCESSES
SECREST, BG
论文数:
0
引用数:
0
h-index:
0
SECREST, BG
BOYD, WW
论文数:
0
引用数:
0
h-index:
0
BOYD, WW
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF CRYSTAL GROWTH,
1971,
10
(03)
: 251
-
&
[6]
COMPARATIVE THERMODYNAMIC ANALYSIS OF INP AND GAAS DEPOSITION
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC,DALLAS,TX 75222
TEXAS INSTR INC,DALLAS,TX 75222
SHAW, DW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1975,
36
(02)
: 111
-
118
[7]
EPITAXIAL GAAS KINETIC STUDIES - (001)ORIENTATION
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 683
-
&
[8]
SELECTIVE EPITAXIAL DEPOSITION OF GALLIUM ARSENIDE IN HOLES
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(09)
: 904
-
&
[9]
INFLUENCE OF SUBSTRATE TEMPERATURE ON GAAS EPITAXIAL DEPOSITION RATES
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 405
-
&
[10]
EFFECTS OF VAPOR COMPOSITION ON GROWTH RATES OF FACETED GALLIUM ARSENIDE HOLE DEPOSITS
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(07)
: 777
-
&
←
1
2
→
共 12 条
[1]
CHANE JP, 1972, J CRYST GROWTH, V13, P336
[2]
IIDA S, 1972, J CRYST GROWTH, V13, P325
[3]
ANISOTROPY IN ETCHING AND DEPOSITION OF SELECTIVE EPITAXIAL GROWTH OF GAAS
ISIBASHI, Y
论文数:
0
引用数:
0
h-index:
0
ISIBASHI, Y
YAMAGUCHI, M
论文数:
0
引用数:
0
h-index:
0
YAMAGUCHI, M
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS,
1970,
9
(08)
: 1007
-
+
[4]
ISIBASHI Y, 1971, JPN J APPL PHYS, V10, P525
[5]
APPLICATION OF FINITE ELEMENT METHOD TO MASS TRANSPORT LIMITED EPITAXIAL GROWTH PROCESSES
SECREST, BG
论文数:
0
引用数:
0
h-index:
0
SECREST, BG
BOYD, WW
论文数:
0
引用数:
0
h-index:
0
BOYD, WW
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF CRYSTAL GROWTH,
1971,
10
(03)
: 251
-
&
[6]
COMPARATIVE THERMODYNAMIC ANALYSIS OF INP AND GAAS DEPOSITION
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
机构:
TEXAS INSTR INC,DALLAS,TX 75222
TEXAS INSTR INC,DALLAS,TX 75222
SHAW, DW
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1975,
36
(02)
: 111
-
118
[7]
EPITAXIAL GAAS KINETIC STUDIES - (001)ORIENTATION
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1970,
117
(05)
: 683
-
&
[8]
SELECTIVE EPITAXIAL DEPOSITION OF GALLIUM ARSENIDE IN HOLES
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1966,
113
(09)
: 904
-
&
[9]
INFLUENCE OF SUBSTRATE TEMPERATURE ON GAAS EPITAXIAL DEPOSITION RATES
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 405
-
&
[10]
EFFECTS OF VAPOR COMPOSITION ON GROWTH RATES OF FACETED GALLIUM ARSENIDE HOLE DEPOSITS
SHAW, DW
论文数:
0
引用数:
0
h-index:
0
SHAW, DW
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(07)
: 777
-
&
←
1
2
→