DIFFRACTION EFFECTS ON PATTERN REPLICATION WITH SYNCHROTRON RADIATION

被引：18

作者：

ATODA, N

KAWAKATSU, H

TANINO, H

ICHIMURA, S

HIRATA, M

HOH, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582766

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1267 / 1270

页数：4

共 7 条

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[2] X-RAY REPLICATION OF MASKS USING SYNCHROTRON RADIATION PRODUCED BY ACO STORAGE RING
FAY, B
TROTEL, J
PETROFF, Y
PINCHAUX, R
THIRY, P
[J]. APPLIED PHYSICS LETTERS, 1976, 29 (06) : 370 - 372
[3] GROBMAN WD, 1980, TECH DIG INT ELECTRO, V415
[4] ION-BEAM EXPOSURE APPARATUS USING A LIQUID-METAL SOURCE
KOMURO, M
[J]. THIN SOLID FILMS, 1982, 92 (1-2) : 155 - 164
[5] APPLICATION OF SYNCHROTRON RADIATION TO X-RAY LITHOGRAPHY
SPILLER, E
EASTMAN, DE
FEDER, R
GROBMAN, WD
GUDAT, W
TOPALIAN, J
[J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) : 5450 - 5459
[6] Tischer P., 1980, From Electronics to Microelectronics. Fourth European Conference on Electrotechnics-EUROCON'80, P46
[7] TOMIMASU T, 1983, IEEE T NUCL SCI, V30