DIMENSIONALITY AND CRITICAL SIZES OF GESI ON SI(100)

被引:37
作者
HANSSON, PO [1 ]
ALBRECHT, M [1 ]
STRUNK, HP [1 ]
BAUSER, E [1 ]
WERNER, JH [1 ]
机构
[1] UNIV ERLANGEN NURNBERG,INST WERKSTOFFWISSENSCH,W-8520 ERLANGEN,GERMANY
关键词
D O I
10.1016/0040-6090(92)90837-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Pseudomorphic heteroepitaxy close to equilibrium is investigated by transmission electron microscopy for GexSi1-x, grown on Si(100) by liquid phase epitaxy. A transition from two-dimensional to island growth (i.e. Stranski-Krastanov growth) at a thickness of h(i) - 1.2 nm (8 monolayers), is observed, which quantitatively validates theoretical assessments of Bauer [5] and Tersoff [8], based on assumptions of equilibrium. Results suggest that the true equilibrium phase of Stranski Krastanov growth involves pseudomorphic islands. exclusively bound by {111} side facets. The critical island thickness h(c.I) = 30 nm exceeds predictions by a factor of two. supporting arguments of a kinetic barrier in the formation of the first misfit dislocation.
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收藏
页码:199 / 202
页数:4
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