LOW-TEMPERATURE GROWTH AND CHARACTERIZATION OF ZNSE FILMS GROWN ON GAAS

被引:16
作者
STANZL, H
WOLF, K
BAUER, S
KUHN, W
NAUMOV, A
GEBHARDT, W
机构
[1] Institut II - Festkörperphysik, University of Regensburg, Regensburg, D-8400
关键词
DITERTIARYBUTYLSELENIDE; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; METALORGANIC VAPOR PHASE EPITAXY; PHOTOLUMINESCENCE; X-RAY DIFFRACTION; ZNSE;
D O I
10.1007/BF02661621
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metalorganic vapor phase epitaxy (MOVPE) growth experiments of ZnSe on GaAs (100) are described using ditertiary butylselenide as the selenium source. The growth temperature was varied between 300 and 400-degrees-C and the growth rate was determined. Below a vapor pressure ratio P(Se)/P(Zn) of about 5, the selenium is the growth limiting component. The quality of the samples was analyzed by Nomarski microscopy, x-ray diffraction, high resolution transmission electron microscopy, and photoluminescence. Although the selenium-precursor was not specially purified, a sharp excitonic luminescence appears in samples grown at 400-degrees-C. The MOVPE growth of ZnSe still suffers from prereactions when H2Se is used. The optimum growth is above 450-degrees-C even with precursors as DMSe or DESe which are less harmful than the hydride. This paper reports results obtained with a novel selenium-precursor: ditertiarybutylselenide.1
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页码:501 / 503
页数:3
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