学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
HYDROGEN-BONDING CONFIGURATIONS IN SILICON-NITRIDE FILMS PREPARED BY PLASMA-ENHANCED DEPOSITION
被引:71
作者
:
MAEDA, M
论文数:
0
引用数:
0
h-index:
0
MAEDA, M
NAKAMURA, H
论文数:
0
引用数:
0
h-index:
0
NAKAMURA, H
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1985年
/ 58卷
/ 01期
关键词
:
D O I
:
10.1063/1.335650
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:484 / 489
页数:6
相关论文
共 14 条
[11]
INFRARED SPECTROSCOPIC STUDY OF HYDROGENATED AND DEUTERATED SILICON-NITRIDE FILMS PREPARED FROM PLASMA-ENHANCED DEPOSITION
[J].
MAEDA, M
论文数:
0
引用数:
0
h-index:
0
MAEDA, M
;
NAKAMURA, H
论文数:
0
引用数:
0
h-index:
0
NAKAMURA, H
.
JOURNAL OF APPLIED PHYSICS,
1984,
55
(08)
:3068
-3071
[12]
MAR KM, 1980, SOLID STATE TECHNOL, V23, P137
[13]
HYDROGEN CONCENTRATION PROFILES AND CHEMICAL BONDING IN SILICON-NITRIDE
[J].
PEERCY, PS
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
PEERCY, PS
;
STEIN, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
STEIN, HJ
;
DOYLE, BL
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
DOYLE, BL
;
PICRAUX, ST
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
PICRAUX, ST
.
JOURNAL OF ELECTRONIC MATERIALS,
1979,
8
(01)
:11
-24
[14]
ANALYSIS OF HYDROGEN CONTENT IN PLASMA SILICON-NITRIDE FILM
[J].
YOSHIMI, T
论文数:
0
引用数:
0
h-index:
0
YOSHIMI, T
;
SAKAI, H
论文数:
0
引用数:
0
h-index:
0
SAKAI, H
;
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
TANAKA, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(08)
:1853
-1854
←
1
2
→
共 14 条
[11]
INFRARED SPECTROSCOPIC STUDY OF HYDROGENATED AND DEUTERATED SILICON-NITRIDE FILMS PREPARED FROM PLASMA-ENHANCED DEPOSITION
[J].
MAEDA, M
论文数:
0
引用数:
0
h-index:
0
MAEDA, M
;
NAKAMURA, H
论文数:
0
引用数:
0
h-index:
0
NAKAMURA, H
.
JOURNAL OF APPLIED PHYSICS,
1984,
55
(08)
:3068
-3071
[12]
MAR KM, 1980, SOLID STATE TECHNOL, V23, P137
[13]
HYDROGEN CONCENTRATION PROFILES AND CHEMICAL BONDING IN SILICON-NITRIDE
[J].
PEERCY, PS
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
PEERCY, PS
;
STEIN, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
STEIN, HJ
;
DOYLE, BL
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
DOYLE, BL
;
PICRAUX, ST
论文数:
0
引用数:
0
h-index:
0
机构:
A. U. S. Department of Energy Facility, Albuquerque, 87185, New Mexico
PICRAUX, ST
.
JOURNAL OF ELECTRONIC MATERIALS,
1979,
8
(01)
:11
-24
[14]
ANALYSIS OF HYDROGEN CONTENT IN PLASMA SILICON-NITRIDE FILM
[J].
YOSHIMI, T
论文数:
0
引用数:
0
h-index:
0
YOSHIMI, T
;
SAKAI, H
论文数:
0
引用数:
0
h-index:
0
SAKAI, H
;
TANAKA, K
论文数:
0
引用数:
0
h-index:
0
TANAKA, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1980,
127
(08)
:1853
-1854
←
1
2
→