HYDROGEN-BONDING CONFIGURATIONS IN SILICON-NITRIDE FILMS PREPARED BY PLASMA-ENHANCED DEPOSITION

被引:71
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MAEDA, M
NAKAMURA, H
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10.1063/1.335650
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O59 [应用物理学];
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页码:484 / 489
页数:6
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[14]   ANALYSIS OF HYDROGEN CONTENT IN PLASMA SILICON-NITRIDE FILM [J].
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