ON THE QUESTION OF MULTIPLE CHARGE STATES OF INTERSTITIAL FE AND CR IN SILICON

被引:5
作者
FEICHTINGER, H
CZAPUTA, R
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1983年 / 79卷 / 02期
关键词
D O I
10.1002/pssa.2210790249
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:K143 / K146
页数:4
相关论文
共 16 条
[1]   CHROMIUM AND CHROMIUM-BORON PAIRS IN SILICON [J].
CONZELMANN, H ;
GRAFF, K ;
WEBER, ER .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 30 (03) :169-175
[2]   LEVEL POSITIONS OF INTERSTITIAL TRANSITION-METAL IMPURITIES IN SILICON [J].
DELEO, GG ;
WATKINS, GD ;
FOWLER, WB .
PHYSICAL REVIEW B, 1982, 25 (08) :4972-4980
[3]   ENERGY-LEVELS AND SOLUBILITY OF INTERSTITIAL CHROMIUM IN SILICON [J].
FEICHTINGER, H ;
CZAPUTA, R .
APPLIED PHYSICS LETTERS, 1981, 39 (09) :706-708
[4]   LOCALIZATION OF FEO-LEVEL IN SILICON [J].
FEICHTINGER, H ;
WALTL, J ;
GSCHWANDTNER, A .
SOLID STATE COMMUNICATIONS, 1978, 27 (09) :867-871
[5]  
FEICHTINGER H, 1979, ACTA PHYS AUSTRIACA, V51, P161
[6]  
FEICHTINGER H, 1983, AGGREGATION PHENOMEN, P134
[7]   THE PROPERTIES OF IRON IN SILICON [J].
GRAFF, K ;
PIEPER, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) :669-674
[8]   SIMPLE MODEL OF MULTIPLE CHARGE STATES OF TRANSITION-METAL IMPURITIES IN SEMICONDUCTORS [J].
HALDANE, FDM ;
ANDERSON, PW .
PHYSICAL REVIEW B, 1976, 13 (06) :2553-2559
[9]   ENERGY-LEVELS AND DEGENERACY RATIOS FOR CHROMIUM IN SILICON [J].
KUNIO, T ;
NISHINO, T ;
OHTA, E ;
SAKATA, M .
SOLID-STATE ELECTRONICS, 1981, 24 (12) :1087-1091
[10]   DONATION CHARACTERISTICS OF IRON IN SILICON [J].
LEMKE, H .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1981, 64 (01) :215-224