ANGLE-RESOLVED AUGER STUDY OF 10-KEV AR+-ION-INDUCED SI LMM ATOMIC LINES

被引:18
作者
BONANNO, A
XU, F
CAMARCA, M
SICILIANO, R
OLIVA, A
机构
[1] CNR,GRP NAZL STRUTTURA MAT,UNITA COSENZA,I-87036 RENDE,ITALY
[2] MINIST PUBBL ISTRUZIONE,CTR INTERUNIV STRUTTURA MAT,I-87036 RENDE,ITALY
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 18期
关键词
D O I
10.1103/PhysRevB.41.12590
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a detailed, angle-resolved Si L-shell Auger study by bombarding a single-crystalline Si sample with 10-keV Ar+ ions. We have observed a new atomic line at kinetic energy of 99 eV which is tentatively assigned to an Auger transition involving two 2p holes in Si+. The existence of two atomic peaks at 61.36 and 91.1 eV has also been clearly confirmed. Our Auger spectra show well-split Doppler peaks for the principal Si0 and Si+ atomic lines and a strong dependence of the shift amplitude on both incidence and detection angles. Successful computer fitting of the angular dependence of Doppler shift has been achieved by using a simple binary-collision model with the Molière approximation to the Thomas-Fermi screening potential. These results suggest that the first violent Ar-Si asymmetric collisions contribute remarkably to the Si 2p-vacancy creation process and are responsible for the ejection of energetic Si(*) particles which is highly directional. The critical minimum Ar-Si approach distance for Si 2p-hole excitation is 0.355, in very good agreement with the value predicted by molecular-orbital theory. © 1990 The American Physical Society.
引用
收藏
页码:12590 / 12598
页数:9
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